Hong Kong Julang Electronic Materials Co., Ltd ., established in 2022, currently has a research and development team of 12 people, five of whom hold doctoral degrees. In line with our overarching development concept “technology drives the future”, we have developed continuous high-power magnetron sputtering technology and plasma immersion ion implantation and deposition technology in recent years. Based on these technologies, high-performance copper film deposition technology and corresponding equipment have been developed. Our company has commenced small-scale production of high-performance ceramic-based copper clad plate, flexible copper clad plate and a lithium-ion battery composite current collector. Compared with competiting products in the market, our our copper-clad plate and composite current collector products are prepared in a fully vacuum environment to eliminate contamination. Thanks to our ion deposition technology, our products offer better quality, higher production efficiency and lower production costs.
Dr Liu Liangliang (Alumnus, Dept. of Physics, CityU)
Mr Ruan Qingdong (Graduate, Southwestern Institute of Physics, China)
Dr Cui Suihan (Graduate, Peking University)
Dr Huang Shiqing (Alumna, Dept. of Management, CityU)
(Info based on the company's application form)
- CityU HK Tech 300 Angel Fund (2024)
- CityU HK Tech 300 Seed Fund (2022)